37760
2,3-Dihydroxynaphthalene
≥98.0% (HPLC)
Manufacturer: Sigma Aldrich
CAS Number: 92-44-4
Synonym(S): 2,3-Naphthalenediol
Select a Size
| Pack Size | SKU | Availability | Price |
|---|---|---|---|
| 50 G | 37760-50-G | In Stock | ₹ 14,635.40 |
| 250 G | 37760-250-G | In Stock | ₹ 24,507.80 |
37760 - 50 G
In Stock
Quantity
1
Base Price: ₹ 14,635.40
GST (18%): ₹ 2,634.372
Total Price: ₹ 17,269.772
Quality Level
200
Assay
≥98.0% (HPLC)
sublimation residue
≤1%
mp
161-165 °C (lit.)162-164 °C
SMILES string
Oc1cc2ccccc2cc1O
InChI
1S/C10H8O2/c11-9-5-7-3-1-2-4-8(7)6-10(9)12/h1-6,11-12H
InChI key
JRNGUTKWMSBIBF-UHFFFAOYSA-N
Gene Information
human ... BAD(572)
Related Products
Description
- General description: 2,3-Dihydroxynaphthalene is a polyhydroxy phenol.[1] It is an aromatic dihydroxy compound having hydroxyl groups at ortho positions.[2] Its reaction with molybdenum(VI) complexes has been reported.[1] The asymmetric oxidative coupling polymerization of 2,3-dihydroxynaphthalene using the Cu(I)-bisoxazoline complex as catalyst has been reported to afford poly(2,3-dihydroxy-1,4-naphthylene), having a continuous 1,1′-bi-2-naphthol main chain structure.[3] The nitrodisplacement reaction between nitrophthalodinitriles and 2,3-dihydroxynaphthalene has been investigated.[2]
- Application: 2,3-Dihydroxynaphthalene may be used in the following studies:Construction of dinaphtho[2,1-b;2′,3′-d]furan-6-ol, via dehydration reaction in the presence of strong acid.[4]As fused ring catecholate type ligand for the surface modification of nanocrystalline TiO2 particles.[5]As adsorptive and competing ligand during the chemical speciation of iron in seawater by cathodic stripping voltammetry.[6]Synthesis of cyclotriphosphazene derivatives, used as non-halogen flame retardants[7]
SAFETY INFORMATION
Pictograms
Signal Word
Danger
Hazard Statements
Precautionary Statements
P264 - P270 - P280 - P301 + P312 - P305 + P351 + P338 - P501
Hazard Classifications
Acute Tox. 4 Oral - Eye Dam. 1
WGK
WGK 3
Flash Point(F)
347.0 °F
Flash Point(C)
175 °C
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
Compare Similar Items
Show Difference
Quality Level: 200
Assay: ≥98.0% (HPLC)
sublimation residue: ≤1%
mp: 161-165 °C (lit.)162-164 °C
SMILES string: Oc1cc2ccccc2cc1O
InChI: 1S/C10H8O2/c11-9-5-7-3-1-2-4-8(7)6-10(9)12/h1-6,11-12H
InChI key: JRNGUTKWMSBIBF-UHFFFAOYSA-N
Gene Information: human ... BAD(572)
Quality Level:
200
Assay:
≥98.0% (HPLC)
sublimation residue:
≤1%
mp:
161-165 °C (lit.)162-164 °C
SMILES string:
Oc1cc2ccccc2cc1O
InChI:
1S/C10H8O2/c11-9-5-7-3-1-2-4-8(7)6-10(9)12/h1-6,11-12H
InChI key:
JRNGUTKWMSBIBF-UHFFFAOYSA-N
Gene Information:
human ... BAD(572)
Quality Level: 200
Assay: __
sublimation residue: __
mp: __
SMILES string: __
InChI: __
InChI key: __
Gene Information: __
Quality Level:
200
Assay:
__
sublimation residue:
__
mp:
__
SMILES string:
__
InChI:
__
InChI key:
__
Gene Information:
__
Quality Level: 100
Assay: 98%
sublimation residue: __
mp: __
SMILES string: C[Si](C)(C)C#CCBr
InChI: 1S/C6H11BrSi/c1-8(2,3)6-4-5-7/h5H2,1-3H3
InChI key: GAPRPFRDVCCCHR-UHFFFAOYSA-N
Gene Information: __
Quality Level:
100
Assay:
98%
sublimation residue:
__
mp:
__
SMILES string:
C[Si](C)(C)C#CCBr
InChI:
1S/C6H11BrSi/c1-8(2,3)6-4-5-7/h5H2,1-3H3
InChI key:
GAPRPFRDVCCCHR-UHFFFAOYSA-N
Gene Information:
__
Quality Level: 200
Assay: 96%
sublimation residue: __
mp: >300 °C (lit.)
SMILES string: CC1(C)CC2(CC(C)(C)c3cc(O)c(O)cc23)c4cc(O)c(O)cc14
InChI: 1S/C21H24O4/c1-19(2)9-21(13-7-17(24)15(22)5-11(13)19)10-20(3,4)12-6-16(23)18(25)8-14(12)21/h5-8,22-25H,9-10H2,1-4H3
InChI key: POFMQEVZKZVAPQ-UHFFFAOYSA-N
Gene Information: human ... SHBG(6462)
Quality Level:
200
Assay:
96%
sublimation residue:
__
mp:
>300 °C (lit.)
SMILES string:
CC1(C)CC2(CC(C)(C)c3cc(O)c(O)cc23)c4cc(O)c(O)cc14
InChI:
1S/C21H24O4/c1-19(2)9-21(13-7-17(24)15(22)5-11(13)19)10-20(3,4)12-6-16(23)18(25)8-14(12)21/h5-8,22-25H,9-10H2,1-4H3
InChI key:
POFMQEVZKZVAPQ-UHFFFAOYSA-N
Gene Information:
human ... SHBG(6462)