393533
3-(2-Hydroxyphenyl)propionic acid
99%
Manufacturer: Sigma Aldrich
CAS Number: 495-78-3
Select a Size
| Pack Size | SKU | Availability | Price |
|---|---|---|---|
| 10 G | 393533-10-G | In Stock | ₹ 2,120.00 |
393533 - 10 G
In Stock
Quantity
1
Base Price: ₹ 2,120.00
GST (18%): ₹ 381.60
Total Price: ₹ 2,501.60
Assay
99%
mp
86-89 °C (lit.)
SMILES string
OC(=O)CCc1ccccc1O
InChI
1S/C9H10O3/c10-8-4-2-1-3-7(8)5-6-9(11)12/h1-4,10H,5-6H2,(H,11,12)
InChI key
CJBDUOMQLFKVQC-UHFFFAOYSA-N
Related Products
Description
- General description: 3-(2-Hydroxyphenyl) propionic acid is a phenyl propionic acid derivative. It was found to be one of the constituents of Justicia pectoralis Jacq. extract which was analyzed by gas chromatography/mass spectrometry (GC/MS).[1] The antiulcerogenic effect of 3-(2-hydroxyphenyl) propionic acid in the prevention of serotonin-induced ulcerogenesis has been studied in rats.[2] It has been reported to be one of the major microbial metabolite of both (+)-catechin and (-)-epicatechin by human faecal microbiota.[3] Crystal structure study reveals that 3-(2-hydroxyphenyl)propionic acid crystals are monoclinic with space group P21/c.[4]
- Application: 3-(2-Hydroxyphenyl)propionic acid is suitable as a growth substrate for various strains of E. coli[5] and as a standard in the study of microbial metabolism of catechin stereoisomers.[3]
SAFETY INFORMATION
Pictograms
Signal Word
Warning
Hazard Statements
Precautionary Statements
P261 - P264 - P271 - P280 - P302 + P352 - P305 + P351 + P338
Hazard Classifications
Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3
Target Organs
Respiratory system
WGK
WGK 3
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
Compare Similar Items
Show Difference
Assay: 99%
mp: 86-89 °C (lit.)
SMILES string: OC(=O)CCc1ccccc1O
InChI: 1S/C9H10O3/c10-8-4-2-1-3-7(8)5-6-9(11)12/h1-4,10H,5-6H2,(H,11,12)
InChI key: CJBDUOMQLFKVQC-UHFFFAOYSA-N
Assay:
99%
mp:
86-89 °C (lit.)
SMILES string:
OC(=O)CCc1ccccc1O
InChI:
1S/C9H10O3/c10-8-4-2-1-3-7(8)5-6-9(11)12/h1-4,10H,5-6H2,(H,11,12)
InChI key:
CJBDUOMQLFKVQC-UHFFFAOYSA-N
Assay: 99.99% trace metals basis
mp: 196-198 °C (dec.) (lit.)
SMILES string: CC(=O)\C=C(\C)O[Ga](O\C(C)=C/C(C)=O)O\C(C)=C/C(C)=O
InChI: 1S/3C5H8O2.Ga/c3*1-4(6)3-5(2)7;/h3*3,6H,1-2H3;/q;;;+3/p-3/b3*4-3-;
InChI key: ZVYYAYJIGYODSD-LNTINUHCSA-K
Assay:
99.99% trace metals basis
mp:
196-198 °C (dec.) (lit.)
SMILES string:
CC(=O)\C=C(\C)O[Ga](O\C(C)=C/C(C)=O)O\C(C)=C/C(C)=O
InChI:
1S/3C5H8O2.Ga/c3*1-4(6)3-5(2)7;/h3*3,6H,1-2H3;/q;;;+3/p-3/b3*4-3-;
InChI key:
ZVYYAYJIGYODSD-LNTINUHCSA-K
Assay: __
mp: __
SMILES string: __
InChI: __
InChI key: __
Assay:
__
mp:
__
SMILES string:
__
InChI:
__
InChI key:
__
Assay: 97%
mp: 63-68 °C (dec.) (lit.)
SMILES string: OCC(CO)CO
InChI: 1S/C4H10O3/c5-1-4(2-6)3-7/h4-7H,1-3H2
InChI key: SFRDXVJWXWOTEW-UHFFFAOYSA-N
Assay:
97%
mp:
63-68 °C (dec.) (lit.)
SMILES string:
OCC(CO)CO
InChI:
1S/C4H10O3/c5-1-4(2-6)3-7/h4-7H,1-3H2
InChI key:
SFRDXVJWXWOTEW-UHFFFAOYSA-N