204552
Tellurium dioxide
99.995% trace metals basis
Manufacturer: Sigma Aldrich
CAS Number: 7446-07-3
Synonym(S): Telluria, Tellurium (IV) oxide, Tellurium oxide
Select a Size
| Pack Size | SKU | Availability | Price |
|---|---|---|---|
| 10 G | 204552-10-G | In Stock | ₹ 7,772.35 |
| 50 G | 204552-50-G | In Stock | ₹ 21,844.85 |
204552 - 10 G
In Stock
Quantity
1
Base Price: ₹ 7,772.35
GST (18%): ₹ 1,399.023
Total Price: ₹ 9,171.373
Quality Level
100
Assay
99.995% trace metals basis
mp
733 °C (lit.)
density
5.67 g/mL at 25 °C (lit.)
SMILES string
O=[Te]=O
InChI
1S/O2Te/c1-3-2
InChI key
LAJZODKXOMJMPK-UHFFFAOYSA-N
Other Options
| Image | Product Name | Manufacturer | Price Range | |
|---|---|---|---|---|
 | Tellurium dioxide | Sigma Aldrich | ₹ 10,900.00 - ₹ 41,960.00 | |
| | Tellurium dioxide | Sigma Aldrich | ₹ 7,599.15 - ₹ 27,885.20 |
Related Products
Description
- Application: Tellurium dioxide can be used:As a seed layer to fabricate hole-extracting electrodes in an organic photovoltaic device. The addition of TeO2 enhances the optical transmittance of the electrode.As a starting material to prepare tellurite glasses for gamma radiation shielding and other optical applications.
SAFETY INFORMATION
Pictograms
Signal Word
Danger
Hazard Statements
Precautionary Statements
P260 - P263 - P273 - P280 - P304 + P340 + P312 - P308 + P313
Hazard Classifications
Acute Tox. 4 Inhalation - Aquatic Chronic 2 - Lact. - Repr. 1B - Skin Sens. 1B
WGK
WGK 3
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
Compare Similar Items
Show Difference
Quality Level: 100
Assay: 99.995% trace metals basis
mp: 733 °C (lit.)
density: 5.67 g/mL at 25 °C (lit.)
SMILES string: O=[Te]=O
InChI: 1S/O2Te/c1-3-2
InChI key: LAJZODKXOMJMPK-UHFFFAOYSA-N
Quality Level:
100
Assay:
99.995% trace metals basis
mp:
733 °C (lit.)
density:
5.67 g/mL at 25 °C (lit.)
SMILES string:
O=[Te]=O
InChI:
1S/O2Te/c1-3-2
InChI key:
LAJZODKXOMJMPK-UHFFFAOYSA-N
Quality Level: 100
Assay: 99.999% trace metals basis
mp: __
density: 4.35 g/mL at 25 °C (lit.)
SMILES string: O.O.O.O.O.O.Cl[Tb](Cl)Cl
InChI: 1S/3ClH.6H2O.Tb/h3*1H;6*1H2;/q;;;;;;;;;+3/p-3
InChI key: ULJUVCOAZNLCJZ-UHFFFAOYSA-K
Quality Level:
100
Assay:
99.999% trace metals basis
mp:
__
density:
4.35 g/mL at 25 °C (lit.)
SMILES string:
O.O.O.O.O.O.Cl[Tb](Cl)Cl
InChI:
1S/3ClH.6H2O.Tb/h3*1H;6*1H2;/q;;;;;;;;;+3/p-3
InChI key:
ULJUVCOAZNLCJZ-UHFFFAOYSA-K
Quality Level: __
Assay: __
mp: __
density: __
SMILES string: __
InChI: __
InChI key: __
Quality Level:
__
Assay:
__
mp:
__
density:
__
SMILES string:
__
InChI:
__
InChI key:
__
Quality Level: 100
Assay: 99.999% trace metals basis
mp: __
density: 7.3 g/mL at 25 °C (lit.)
SMILES string: O=[Tb]O[Tb](=O)O[Tb](=O)O[Tb]=O
InChI: 1S/7O.4Tb
InChI key: UWZVBPNIJCKCMC-UHFFFAOYSA-N
Quality Level:
100
Assay:
99.999% trace metals basis
mp:
__
density:
7.3 g/mL at 25 °C (lit.)
SMILES string:
O=[Tb]O[Tb](=O)O[Tb](=O)O[Tb]=O
InChI:
1S/7O.4Tb
InChI key:
UWZVBPNIJCKCMC-UHFFFAOYSA-N