455830
Ammonium hydrogen difluoride
99.999% trace metals basis
Manufacturer: Sigma Aldrich
CAS Number: 1341-49-7
Synonym(S): Ammonium bifluoride, Etching powder
Select a Size
| Pack Size | SKU | Availability | Price |
|---|---|---|---|
| 25 G | 455830-25-G | In Stock | ₹ 8,779.08 |
| 100 G | 455830-100-G | In Stock | ₹ 26,759.40 |
455830 - 25 G
In Stock
Quantity
1
Base Price: ₹ 8,779.08
GST (18%): ₹ 1,580.234
Total Price: ₹ 10,359.314
Quality Level
100
Assay
99.999% trace metals basis
form
crystalline
impurities
≤15.0 ppm Trace Metal Analysis
mp
125 °C (lit.)
SMILES string
N.F.F
InChI
1S/2FH.H3N/h2*1H;1H3
InChI key
KVBCYCWRDBDGBG-UHFFFAOYSA-N
Other Options
| Image | Product Name | Manufacturer | Price Range | |
|---|---|---|---|---|
 | Sigma Aldrich Fine Chemicals Biosciences Ammonium hydrogen difluoride 99.999% trace metals basis | 1341-49-7 | MFCD00012018 | 100G | Sigma Aldrich Fine Chemicals Biosciences | ₹ 33,225.51 | |
 | Strem, An Ascensus Company CAS# 1341-49-7. 500g. Ammonium hydrogen fluoride, min. 96% (contains 3-4% NH4F). MFCD00012018 | Strem, An Ascensus Company | ₹ 5,005.26 | |
 | Ammonium hydrogen difluoride | Sigma Aldrich | ₹ 5,055.28 - ₹ 44,999.53 | |
| | Ammonium hydrogen difluoride | Sigma Aldrich | ₹ 5,055.28 - ₹ 44,999.53 | |
 | Ammonium Hydrogen Fluoride | Aaron Chemicals LLC | -- | |
 | 1341-49-7 | Ammonium hydrogen fluoride | A2B Chem | ₹ 1,540.08 |
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Description
- General description: Ammonium hydrogen difluoride is a white crystalline solid commonly used as an etchant, especially in the semiconductor industry. It has excellent selectivity in etching silicon oxides and metal silicides, making it useful in the manufacturing of semiconductors and microelectronic devices. It can also be used as a fluorinating agent.[1][2]
- Application: Used for the preparation of ammonium aminosilylfluorides[3] and complex metal fluorides.[4] Employed in a new hydrothermal synthesis of complex flourides NaHoF4 and NaEuF4; these interesting compounds have the fluorite structure and are important for solid-state lasers as well as for photoluminescence and magnetic characteristics[5]
SAFETY INFORMATION
Pictograms
Signal Word
Danger
Hazard Statements
Precautionary Statements
P260 - P280 - P303 + P361 + P353 - P304 + P340 + P310 - P305 + P351 + P338 - P363
Hazard Classifications
Acute Tox. 3 Oral - Eye Dam. 1 - Skin Corr. 1B
WGK
WGK 1
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
Compare Similar Items
Show Difference
Quality Level: 100
Assay: 99.999% trace metals basis
form: crystalline
impurities: ≤15.0 ppm Trace Metal Analysis
mp: 125 °C (lit.)
SMILES string: N.F.F
InChI: 1S/2FH.H3N/h2*1H;1H3
InChI key: KVBCYCWRDBDGBG-UHFFFAOYSA-N
Quality Level:
100
Assay:
99.999% trace metals basis
form:
crystalline
impurities:
≤15.0 ppm Trace Metal Analysis
mp:
125 °C (lit.)
SMILES string:
N.F.F
InChI:
1S/2FH.H3N/h2*1H;1H3
InChI key:
KVBCYCWRDBDGBG-UHFFFAOYSA-N
Quality Level: 200
Assay: 99.99% trace metals basis
form: crystalline
impurities: ≤200 mg/kg Trace metallic impurities analysis (ICP)
mp: 121-145 °C (lit.)
SMILES string: N.OS(O)(=O)=O
InChI: 1S/H3N.H2O4S/c;1-5(2,3)4/h1H3;(H2,1,2,3,4)
InChI key: BIGPRXCJEDHCLP-UHFFFAOYSA-N
Quality Level:
200
Assay:
99.99% trace metals basis
form:
crystalline
impurities:
≤200 mg/kg Trace metallic impurities analysis (ICP)
mp:
121-145 °C (lit.)
SMILES string:
N.OS(O)(=O)=O
InChI:
1S/H3N.H2O4S/c;1-5(2,3)4/h1H3;(H2,1,2,3,4)
InChI key:
BIGPRXCJEDHCLP-UHFFFAOYSA-N
Quality Level: 200
Assay: 99.99% trace metals basis
form: crystalline
impurities: ≤200 mg/kg Trace metallic impurities analysis (ICP)
mp: 121-145 °C (lit.)
SMILES string: N.OS(O)(=O)=O
InChI: 1S/H3N.H2O4S/c;1-5(2,3)4/h1H3;(H2,1,2,3,4)
InChI key: BIGPRXCJEDHCLP-UHFFFAOYSA-N
Quality Level:
200
Assay:
99.99% trace metals basis
form:
crystalline
impurities:
≤200 mg/kg Trace metallic impurities analysis (ICP)
mp:
121-145 °C (lit.)
SMILES string:
N.OS(O)(=O)=O
InChI:
1S/H3N.H2O4S/c;1-5(2,3)4/h1H3;(H2,1,2,3,4)
InChI key:
BIGPRXCJEDHCLP-UHFFFAOYSA-N
Quality Level: 200
Assay: 99.99% trace metals basis
form: crystalline
impurities: ≤200 mg/kg Trace metallic impurities analysis (ICP)
mp: 121-145 °C (lit.)
SMILES string: N.OS(O)(=O)=O
InChI: 1S/H3N.H2O4S/c;1-5(2,3)4/h1H3;(H2,1,2,3,4)
InChI key: BIGPRXCJEDHCLP-UHFFFAOYSA-N
Quality Level:
200
Assay:
99.99% trace metals basis
form:
crystalline
impurities:
≤200 mg/kg Trace metallic impurities analysis (ICP)
mp:
121-145 °C (lit.)
SMILES string:
N.OS(O)(=O)=O
InChI:
1S/H3N.H2O4S/c;1-5(2,3)4/h1H3;(H2,1,2,3,4)
InChI key:
BIGPRXCJEDHCLP-UHFFFAOYSA-N