202118
Hafnium(IV) oxide
powder, 98%
Manufacturer: Sigma Aldrich
CAS Number: 12055-23-1
Select a Size
| Pack Size | SKU | Availability | Price |
|---|---|---|---|
| 25 G | 202118-25-G | In Stock | ₹ 7,209.45 |
| 100 G | 202118-100-G | In Stock | ₹ 19,647.38 |
202118 - 25 G
In Stock
Quantity
1
Base Price: ₹ 7,209.45
GST (18%): ₹ 1,297.701
Total Price: ₹ 8,507.151
Quality Level
100
Assay
98%
form
powder
density
9.68 g/mL at 25 °C (lit.)
SMILES string
O=[Hf]=O
InChI
1S/Hf.2O
InChI key
CJNBYAVZURUTKZ-UHFFFAOYSA-N
Other Options
| Image | Product Name | Manufacturer | Price Range | |
|---|---|---|---|---|
 | Sigma Aldrich Fine Chemicals Biosciences Hafnium(IV) oxide >=99.95% | 12055-23-1 | MFCD00003565 | 1G | Sigma Aldrich Fine Chemicals Biosciences | ₹ 20,388.12 | |
 | Hafnium(IV) oxide | Sigma Aldrich | ₹ 8,822.38 | |
 | 12055-23-1 | Hafnium oxide (HfO2) | A2B Chem | ₹ 1,424.00 - ₹ 47,348.00 |
Related Products
Description
- Application: Hafnium(IV) oxide: Utilized predominantly in the semiconductor industry, Hafnium(IV) oxide offers excellent thermal and chemical stability, which makes it suitable as a high-k gate dielectric material in metal-oxide-semiconductor (MOS) devices. Its application has become increasingly important with the miniaturization of electronic components, aiding in the enhancement of transistor performance without further reducing the component size. This role is critical in the development of more efficient, faster computing technologies (Sigma-Aldrich, CAS 12055-23-1).
SAFETY INFORMATION
WGK
nwg
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
Compare Similar Items
Show Difference
Quality Level: 100
Assay: 98%
form: powder
density: 9.68 g/mL at 25 °C (lit.)
SMILES string: O=[Hf]=O
InChI: 1S/Hf.2O
InChI key: CJNBYAVZURUTKZ-UHFFFAOYSA-N
Quality Level:
100
Assay:
98%
form:
powder
density:
9.68 g/mL at 25 °C (lit.)
SMILES string:
O=[Hf]=O
InChI:
1S/Hf.2O
InChI key:
CJNBYAVZURUTKZ-UHFFFAOYSA-N
Quality Level: 200
Assay: 99.9% trace metals basis
form: __
density: __
SMILES string: [Cs+].[Cs+].[O-]C([O-])=O
InChI: 1S/CH2O3.2Cs/c2-1(3)4;;/h(H2,2,3,4);;/q;2*+1/p-2
InChI key: FJDQFPXHSGXQBY-UHFFFAOYSA-L
Quality Level:
200
Assay:
99.9% trace metals basis
form:
__
density:
__
SMILES string:
[Cs+].[Cs+].[O-]C([O-])=O
InChI:
1S/CH2O3.2Cs/c2-1(3)4;;/h(H2,2,3,4);;/q;2*+1/p-2
InChI key:
FJDQFPXHSGXQBY-UHFFFAOYSA-L
Quality Level: 200
Assay: 99.9% trace metals basis
form: __
density: __
SMILES string: [Cs+].[Cs+].[O-]C([O-])=O
InChI: 1S/CH2O3.2Cs/c2-1(3)4;;/h(H2,2,3,4);;/q;2*+1/p-2
InChI key: FJDQFPXHSGXQBY-UHFFFAOYSA-L
Quality Level:
200
Assay:
99.9% trace metals basis
form:
__
density:
__
SMILES string:
[Cs+].[Cs+].[O-]C([O-])=O
InChI:
1S/CH2O3.2Cs/c2-1(3)4;;/h(H2,2,3,4);;/q;2*+1/p-2
InChI key:
FJDQFPXHSGXQBY-UHFFFAOYSA-L
Quality Level: 100
Assay: 99.9% trace metals basis
form: powder
density: 4.51 g/mL at 25 °C (lit.)
SMILES string: [I-].[Cs+]
InChI: 1S/Cs.HI/h;1H/q+1;/p-1
InChI key: XQPRBTXUXXVTKB-UHFFFAOYSA-M
Quality Level:
100
Assay:
99.9% trace metals basis
form:
powder
density:
4.51 g/mL at 25 °C (lit.)
SMILES string:
[I-].[Cs+]
InChI:
1S/Cs.HI/h;1H/q+1;/p-1
InChI key:
XQPRBTXUXXVTKB-UHFFFAOYSA-M