632317
Indium(III) oxide
nanopowder, <100 nm particle size (TEM), 99.9% trace metals basis
Manufacturer: Sigma Aldrich
CAS Number: 1312-43-2
Synonym(S): Diindium trioxide, Indium sesquioxide
Select a Size
| Pack Size | SKU | Availability | Price |
|---|---|---|---|
| 5 G | 632317-5-G | In Stock | ₹ 13,531.25 |
| 25 G | 632317-25-G | In Stock | ₹ 29,628.03 |
632317 - 5 G
In Stock
Quantity
1
Base Price: ₹ 13,531.25
GST (18%): ₹ 2,435.625
Total Price: ₹ 15,966.875
vapor pressure
<0.01 mmHg ( 25 °C)
Quality Level
100
Assay
99.9% trace metals basis
form
nanopowder
reaction suitability
reagent type: catalystcore: indium
particle size
<100 nm (TEM)
density
7.18 g/mL at 25 °C (lit.)
SMILES string
O=[In]O[In]=O
InChI
1S/2In.3O
InChI key
SHTGRZNPWBITMM-UHFFFAOYSA-N
Other Options
| Image | Product Name | Manufacturer | Price Range | |
|---|---|---|---|---|
 | Strem, An Ascensus Company CAS# 1312-43-2. 25g. Indium(III) oxide (99.998%-In) PURATREM. MFCD00011060 | Strem, An Ascensus Company | ₹ 24,846.62 | |
 | Strem, An Ascensus Company CAS# 1312-43-2. 5g. Indium(III) oxide (99.998%-In) PURATREM. MFCD00011060 | Strem, An Ascensus Company | ₹ 5,775.30 | |
 | Indium(III) oxide | Sigma Aldrich | ₹ 8,605.88 - ₹ 41,578.83 | |
| | Indium(III) oxide | Sigma Aldrich | ₹ 7,620.00 - ₹ 48,225.38 | |
| | Indium(III) oxide | Sigma Aldrich | ₹ 7,620.00 - ₹ 48,225.38 | |
| | Indium(III) oxide | Sigma Aldrich | ₹ 8,605.88 - ₹ 41,578.83 | |
| | Indium(III) oxide | Sigma Aldrich | ₹ 6,280.54 - ₹ 9,540.00 | |
 | 1312-43-2 | Indium oxide (In2O3) | A2B Chem | ₹ 1,796.76 - ₹ 5,475.84 |
Related Products
Description
- Application: Amine Functionalized Surface Frustrated Lewis Pairs for CO2 Photocatalysis: Discusses the enhancement of photocatalytic performance for CO2 reduction using indium oxide hydroxide with amine-functionalized surface frustrated Lewis pairs (Q Guan et al., 2024).Enhancing Gas Sensing Performance through UV Photoexcitation: Explores the improvement of room-temperature gas sensing capabilities of metal oxide semiconductor chemiresistors, including indium(III) oxide, by 400 nm UV photoexcitation (S Paul et al., 2024).Indium(III) Complexes in Industry and Nanoparticle Synthesis: Reviews the use of trivalent indium complexes as catalysts and precursors for various industrial applications and the synthesis of nanoparticles like indium oxide (TO Ajiboye et al., 2024).Ag/In2O3 Inverse Opal Synthesis: Details the synthesis and perspectives of silver/indium oxide inverse opal structures, highlighting their potential in semiconductor applications due to their optical properties (AV Lyutova et al., 2024).Photocatalytic Generation of Hydroxyl Radicals and Manganese Species: Investigates the use of indium oxide in enhancing the photocatalytic performance of permanganate for efficient micropollutant removal under visible light (J Li et al., 2024).
SAFETY INFORMATION
WGK
WGK 3
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
Compare Similar Items
Show Difference
vapor pressure: <0.01 mmHg ( 25 °C)
Quality Level: 100
Assay: 99.9% trace metals basis
form: nanopowder
reaction suitability: reagent type: catalystcore: indium
particle size: <100 nm (TEM)
density: 7.18 g/mL at 25 °C (lit.)
SMILES string: O=[In]O[In]=O
InChI: 1S/2In.3O
InChI key: SHTGRZNPWBITMM-UHFFFAOYSA-N
vapor pressure:
<0.01 mmHg ( 25 °C)
Quality Level:
100
Assay:
99.9% trace metals basis
form:
nanopowder
reaction suitability:
reagent type: catalystcore: indium
particle size:
<100 nm (TEM)
density:
7.18 g/mL at 25 °C (lit.)
SMILES string:
O=[In]O[In]=O
InChI:
1S/2In.3O
InChI key:
SHTGRZNPWBITMM-UHFFFAOYSA-N
vapor pressure: __
Quality Level: 100
Assay: 97%
form: __
reaction suitability: __
particle size: __
density: __
SMILES string: [H]C(=O)c1cccc2cc[nH]c12
InChI: 1S/C9H7NO/c11-6-8-3-1-2-7-4-5-10-9(7)8/h1-6,10H
InChI key: XQVZDADGTFJAFM-UHFFFAOYSA-N
vapor pressure:
__
Quality Level:
100
Assay:
97%
form:
__
reaction suitability:
__
particle size:
__
density:
__
SMILES string:
[H]C(=O)c1cccc2cc[nH]c12
InChI:
1S/C9H7NO/c11-6-8-3-1-2-7-4-5-10-9(7)8/h1-6,10H
InChI key:
XQVZDADGTFJAFM-UHFFFAOYSA-N
vapor pressure: __
Quality Level: 100
Assay: 97%
form: solid
reaction suitability: __
particle size: __
density: __
SMILES string: OC(=O)c1cccnc1Br
InChI: 1S/C6H4BrNO2/c7-5-4(6(9)10)2-1-3-8-5/h1-3H,(H,9,10)
InChI key: MMWNKXIFVYQOTK-UHFFFAOYSA-N
vapor pressure:
__
Quality Level:
100
Assay:
97%
form:
solid
reaction suitability:
__
particle size:
__
density:
__
SMILES string:
OC(=O)c1cccnc1Br
InChI:
1S/C6H4BrNO2/c7-5-4(6(9)10)2-1-3-8-5/h1-3H,(H,9,10)
InChI key:
MMWNKXIFVYQOTK-UHFFFAOYSA-N
vapor pressure: __
Quality Level: 200
Assay: __
form: __
reaction suitability: __
particle size: __
density: __
SMILES string: __
InChI: 1S/C19H34N.ClH/c1-4-5-6-7-8-9-10-14-17-20(2,3)18-19-15-12-11-13-16-19;/h11-13,15-16H,4-10,14,17-18H2,1-3H3;1H/q+1;/p-1
InChI key: TTZLKXKJIMOHHG-UHFFFAOYSA-M
vapor pressure:
__
Quality Level:
200
Assay:
__
form:
__
reaction suitability:
__
particle size:
__
density:
__
SMILES string:
__
InChI:
1S/C19H34N.ClH/c1-4-5-6-7-8-9-10-14-17-20(2,3)18-19-15-12-11-13-16-19;/h11-13,15-16H,4-10,14,17-18H2,1-3H3;1H/q+1;/p-1
InChI key:
TTZLKXKJIMOHHG-UHFFFAOYSA-M