Arsenic implant in silicon depth profile standard

Description

• General description: This Standard Reference Material (SRM) is intended for use in calibrating secondary ion response to minor and trace levels of arsenic in a silicon matrix by the analytical technique of secondary ion mass spectrometry (SIMS). It may also be used by a laboratory as a transfer standard for the calibration of working standards of arsenic in silicon.For more information, please refer to the SDS and COA.SRM 2134_certSRM 2134_SDS
• Other Notes: Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values.Arsenic (75As)See certificate for values and more details at nist.gov/SRM.
• Legal Information: NIST is a registered trademark of National Institute of Standards and Technology