Nickel(II) nitrate hexahydrate
99.999% trace metals basis
Manufacturer: Sigma Aldrich
CAS Number: 13478-00-7
Synonym(S): Nickel dinitrate hexahydrate, Nickel nitrate hexahydrate, Nickel(2+) dinitrate hexahydrate, Nickelous nitrate hexahydrate
Select a Size
| Pack Size | SKU | Availability | Price |
|---|---|---|---|
| 20 G | 203874-20-G | In Stock | ₹ 5,693.95 |
| 100 G | 203874-100-G | In Stock | ₹ 18,521.58 |
| 500 G | 203874-500-G | In Stock | ₹ 84,229.33 |
203874 - 20 G
In Stock
Quantity
1
Base Price: ₹ 5,693.95
GST (18%): ₹ 1,024.911
Total Price: ₹ 6,718.861
Quality Level
200
Assay
99.999% trace metals basis
form
solid
impurities
≤15.0 ppm Trace Metal Analysis
mp
56 °C (lit.)
density
2.05 g/mL at 25 °C (lit.)
application(s)
battery manufacturing
SMILES string
O.O.O.O.O.O.[Ni++].[O-][N+]([O-])=O.[O-][N+]([O-])=O
InChI
1S/2NO3.Ni.6H2O/c2*2-1(3)4;;;;;;;/h;;;6*1H2/q2*-1;+2;;;;;;
InChI key
AOPCKOPZYFFEDA-UHFFFAOYSA-N
Other Options
Related Products
Description
- Application: Nickel(II) nitrate hexahydrate can be used:As an additive in the fabrication of cellulose acetate polymers(CA) to control the porosity of the polymer. The formation of Ni(NO3)2.6H2O aggregates in polymer matrix during solidification and the strong interaction between Ni, nitrate, and water molecules result in the formation of well-defined pores on the surface of the CA matrix.As a starting material to prepare nickel(ii) Schiff base, which is used as a precursor to synthesize NiO nanoparticles by solid-state thermal decomposition method.As a dopant to prepare Ni-Ceria catalyst for selective hydrogenation of acetylene.As a catalyst to prepare 3,4-dihydropyrimidinone derivatives via Biginelli cyclocondensation.
SAFETY INFORMATION
Pictograms
Signal Word
Danger
Hazard Statements
H272,H302 + H332,H315,H317,H318,H334,H341,H350,H360,H372,H410
Precautionary Statements
P210 - P273 - P280 - P301 + P312 - P305 + P351 + P338 - P308 + P313
Hazard Classifications
Acute Tox. 4 Inhalation - Acute Tox. 4 Oral - Aquatic Acute 1 - Aquatic Chronic 1 - Carc. 1A - Eye Dam. 1 - Muta. 2 - Ox. Sol. 2 - Repr. 1B - Resp. Sens. 1 - Skin Irrit. 2 - Skin Sens. 1 - STOT RE 1 Inhalation
WGK
WGK 3
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
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Quality Level: 200
Assay: 99.999% trace metals basis
form: solid
impurities: ≤15.0 ppm Trace Metal Analysis
mp: 56 °C (lit.)
density: 2.05 g/mL at 25 °C (lit.)
application(s): battery manufacturing
SMILES string: O.O.O.O.O.O.[Ni++].[O-][N+]([O-])=O.[O-][N+]([O-])=O
InChI: 1S/2NO3.Ni.6H2O/c2*2-1(3)4;;;;;;;/h;;;6*1H2/q2*-1;+2;;;;;;
InChI key: AOPCKOPZYFFEDA-UHFFFAOYSA-N
Quality Level: 100
Assay: 99.99% trace metals basis
form: powder and chunks
impurities: __
mp: __
density: 6.67 g/mL at 25 °C (lit.)
application(s): battery manufacturing
SMILES string: [Ni]=O
InChI: 1S/Ni.O
InChI key: GNRSAWUEBMWBQH-UHFFFAOYSA-N
Quality Level: 100
Assay: 99.99% trace metals basis
form: powder and chunks
impurities: __
mp: __
density: 6.67 g/mL at 25 °C (lit.)
application(s): battery manufacturing
SMILES string: [Ni]=O
InChI: 1S/Ni.O
InChI key: GNRSAWUEBMWBQH-UHFFFAOYSA-N
