666610

Tetrakis(dimethylamido)hafnium(IV)

packaged for use in deposition systems

Manufacturer: Sigma Aldrich

CAS Number: 19782-68-4

Synonym(S): TDMAH, Tetrakis(dimethylamino)hafnium(IV)

Select a Size

Pack Size SKU Availability Price
25 G 666610-25-G In Stock ₹ 1,40,876.55

666610 - 25 G

₹ 1,40,876.55

In Stock

Quantity

1

Base Price: ₹ 1,40,876.55

GST (18%): ₹ 25,357.779

Total Price: ₹ 1,66,234.329

Quality Level

100

Assay

≥99.99% (trace metals analysis)

form

low-melting solid

reaction suitability

core: hafnium

mp

26-29 °C (lit.)

density

1.098 g/mL at 25 °C

SMILES string

CN(C)[Hf](N(C)C)(N(C)C)N(C)C

InChI

1S/4C2H6N.Hf/c4*1-3-2;/h4*1-2H3;/q4*-1;+4

InChI key

ZYLGGWPMIDHSEZ-UHFFFAOYSA-N

Other Options

Image Product Name Manufacturer Price Range
50-201-6677
Strem, An Ascensus Company CAS# 19782-68-4. 1g. Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH, PURATREM. MFCD01862473
Strem, An Ascensus Company ₹ 13,963.39
455199
Tetrakis(dimethylamido)hafnium(IV)
Sigma Aldrich ₹ 94,891.95
AR002CYE
Methanamine, N-methyl-, hafnium(4+) salt (4:1)
Aaron Chemicals LLC --
AB09002
19782-68-4 | Methanamine, N-methyl-, hafnium(4+) salt (4:1)
A2B Chem ₹ 15,315.24 - ₹ 99,249.60

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Description

  • General description: Alkyl amides of Hafnium provide a convenient and effective atomic layer deposition precursor to smooth and and amorphous hafnium oxide thin films.[1][2][3][4]
  • Application: Precursors Packaged for Depositions Systems

SAFETY INFORMATION

Pictograms

GHS02,GHS05

Signal Word

Danger

Hazard Statements

H228,H261,H314

Precautionary Statements

P210 - P231 + P232 - P280 - P305 + P351 + P338 - P370 + P378 - P402 + P404

Hazard Classifications

Flam. Sol. 1 - Skin Corr. 1B - Water-react 2

Supplementary Hazards

EUH014

WGK

WGK 3

Flash Point(F)

109.4 °F

Flash Point(C)

43 °C

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Compare Similar Items

Show Difference

Img

Sigma Aldrich

666610

packaged for use in deposition syst...


Quality Level:
100

Assay:
≥99.99% (trace metals analysis)

form:
low-melting solid

reaction suitability:
core: hafnium

mp:
26-29 °C (lit.)

density:
1.098 g/mL at 25 °C

SMILES string:
CN(C)[Hf](N(C)C)(N(C)C)N(C)C

InChI:
1S/4C2H6N.Hf/c4*1-3-2;/h4*1-2H3;/q4*-1;+4

InChI key:
ZYLGGWPMIDHSEZ-UHFFFAOYSA-N

Img

Sigma Aldrich

666629

97%...


Quality Level:
100

Assay:
97%

form:
solid

reaction suitability:
reaction type: Buchwald-Hartwig Cross Coupling Reactionreaction type: Heck Reactionreaction type: Hiyama Couplingreaction type: Negishi Couplingreaction type: Sonogashira Couplingreaction type: Stille Couplingreaction type: Suzuki-Miyaura Couplingreagent type: ligand

mp:
70-75 °C

density:
__

SMILES string:
FC(F)(F)c1ccc(cc1)P(c2ccc(cc2)C(F)(F)F)c3ccc(cc3)C(F)(F)F

InChI:
1S/C21H12F9P/c22-19(23,24)13-1-7-16(8-2-13)31(17-9-3-14(4-10-17)20(25,26)27)18-11-5-15(6-12-18)21(28,29)30/h1-12H

InChI key:
PXYCJKZSCDFXLR-UHFFFAOYSA-N

Img

Sigma Aldrich

666718

97%...


Quality Level:
100

Assay:
97%

form:
__

reaction suitability:
__

mp:
__

density:
0.819 g/mL at 25 °C

SMILES string:
CCCCC[C@@H](O)CC

InChI:
1S/C8H18O/c1-3-5-6-7-8(9)4-2/h8-9H,3-7H2,1-2H3/t8-/m0/s1

InChI key:
NMRPBPVERJPACX-QMMMGPOBSA-N

Img

Sigma Aldrich

666742

≥95%...


Quality Level:
100

Assay:
≥95%

form:
__

reaction suitability:
__

mp:
98-102 °C

density:
__

SMILES string:
CC(C)Oc1ccc(cc1C=O)B(O)O

InChI:
1S/C10H13BO4/c1-7(2)15-10-4-3-9(11(13)14)5-8(10)6-12/h3-7,13-14H,1-2H3

InChI key:
MFWMHBLPARKSLU-UHFFFAOYSA-N