160326
4,4′-Bis(diethylamino)benzophenone
≥99%
Manufacturer: Sigma Aldrich
CAS Number: 90-93-7
Synonym(S): 4,4′-(Tetraethyldiamino)benzophenone, 4,4′-Bis(diethylamino)diphenyl ketone, p ,p ′-Tetraethyldiaminobenzophenone, Bis[4-(diethylamino)phenyl]methanone, Michler′s ethyl ketone
Select a Size
| Pack Size | SKU | Availability | Price |
|---|---|---|---|
| 25 G | 160326-25-G | In Stock | ₹ 4,124.33 |
| 100 G | 160326-100-G | In Stock | ₹ 7,718.23 |
160326 - 25 G
In Stock
Quantity
1
Base Price: ₹ 4,124.33
GST (18%): ₹ 742.379
Total Price: ₹ 4,866.709
Quality Level
200
Assay
≥99%
mp
89-92 °C (lit.)
SMILES string
CCN(CC)c1ccc(cc1)C(=O)c2ccc(cc2)N(CC)CC
InChI
1S/C21H28N2O/c1-5-22(6-2)19-13-9-17(10-14-19)21(24)18-11-15-20(16-12-18)23(7-3)8-4/h9-16H,5-8H2,1-4H3
InChI key
VYHBFRJRBHMIQZ-UHFFFAOYSA-N
Other Options
| Image | Product Name | Manufacturer | Price Range | |
|---|---|---|---|---|
 | eMolecules Ambeed / 44-Bis(diethylamino) benzophenone / 25g / 525226493 / A580481 / / 90-93-7 / MFCD00009044 / 324.468 / C21H28N2O | eMolecules | ₹ 2,854.28 | |
 | 4,4'-Bis(diethylamino)benzophenone | ChemScene | ₹ 5,903.64 - ₹ 11,208.36 | |
 | 90-93-7 | 4,4'-Bis(diethylamino)benzophenone | A2B Chem | ₹ 1,540.08 - ₹ 15,058.56 |
Related Products
Description
- Application: The effect of 4, 4′-bis (N, N-diethylamino) benzophenone on the degree of conversion in liquid photopolymer for dental 3D printing: Examines its use as a co-initiator in dental 3D printing materials (DH Lee et al., 2015). Ketone Number and Substitution Effect of Benzophenone Derivatives on the Free Radical Photopolymerization: Compares its performance with other photoinitiators in polymerization (TL Huang, YC Chen, 2021). Michler′s ethylketone as a novel negative-ion matrix for the enhancement of lipid MALDI tissue imaging: Uses 4,4′-bis(diethylamino)benzophenone in matrix-assisted laser desorption/ionization (MALDI) for tissue imaging (Y Shi et al., 2022).
SAFETY INFORMATION
WGK
WGK 2
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
Compare Similar Items
Show Difference
Quality Level: 200
Assay: ≥99%
mp: 89-92 °C (lit.)
SMILES string: CCN(CC)c1ccc(cc1)C(=O)c2ccc(cc2)N(CC)CC
InChI: 1S/C21H28N2O/c1-5-22(6-2)19-13-9-17(10-14-19)21(24)18-11-15-20(16-12-18)23(7-3)8-4/h9-16H,5-8H2,1-4H3
InChI key: VYHBFRJRBHMIQZ-UHFFFAOYSA-N
Quality Level:
200
Assay:
≥99%
mp:
89-92 °C (lit.)
SMILES string:
CCN(CC)c1ccc(cc1)C(=O)c2ccc(cc2)N(CC)CC
InChI:
1S/C21H28N2O/c1-5-22(6-2)19-13-9-17(10-14-19)21(24)18-11-15-20(16-12-18)23(7-3)8-4/h9-16H,5-8H2,1-4H3
InChI key:
VYHBFRJRBHMIQZ-UHFFFAOYSA-N
Quality Level: 200
Assay: ≥99.5%
mp: __
SMILES string: __
InChI: __
InChI key: __
Quality Level:
200
Assay:
≥99.5%
mp:
__
SMILES string:
__
InChI:
__
InChI key:
__
Quality Level: 300
Assay: 98%
mp: >300 °C (lit.)
SMILES string: [K]N1C(=O)c2ccccc2C1=O
InChI: 1S/C8H5NO2.K/c10-7-5-3-1-2-4-6(5)8(11)9-7;/h1-4H,(H,9,10,11);/q;+1/p-1
InChI key: FYRHIOVKTDQVFC-UHFFFAOYSA-M
Quality Level:
300
Assay:
98%
mp:
>300 °C (lit.)
SMILES string:
[K]N1C(=O)c2ccccc2C1=O
InChI:
1S/C8H5NO2.K/c10-7-5-3-1-2-4-6(5)8(11)9-7;/h1-4H,(H,9,10,11);/q;+1/p-1
InChI key:
FYRHIOVKTDQVFC-UHFFFAOYSA-M
Quality Level: 100
Assay: __
mp: __
SMILES string: O=C(CC(=O)OCc1ccccc1)OCc2ccccc2
InChI: 1S/C17H16O4/c18-16(20-12-14-7-3-1-4-8-14)11-17(19)21-13-15-9-5-2-6-10-15/h1-10H,11-13H2
InChI key: RYFCSKVXWRJEOB-UHFFFAOYSA-N
Quality Level:
100
Assay:
__
mp:
__
SMILES string:
O=C(CC(=O)OCc1ccccc1)OCc2ccccc2
InChI:
1S/C17H16O4/c18-16(20-12-14-7-3-1-4-8-14)11-17(19)21-13-15-9-5-2-6-10-15/h1-10H,11-13H2
InChI key:
RYFCSKVXWRJEOB-UHFFFAOYSA-N