414999
3,4-Epoxytetrahydrothiophene-1,1-dioxide
97%
Manufacturer: Sigma Aldrich
CAS Number: 4509-11-9
Synonym(S): 3,4-Epoxysulfolane
Select a Size
| Pack Size | SKU | Availability | Price |
|---|---|---|---|
| 1 G | 414999-1-G | In Stock | ₹ 8,660.00 |
414999 - 1 G
In Stock
Quantity
1
Base Price: ₹ 8,660.00
GST (18%): ₹ 1,558.80
Total Price: ₹ 10,218.80
Assay
97%
mp
145-150 °C (lit.)
SMILES string
O=S1(=O)CC2OC2C1
InChI
1S/C4H6O3S/c5-8(6)1-3-4(2-8)7-3/h3-4H,1-2H2
InChI key
SZAIAWVGWTXVMB-UHFFFAOYSA-N
Other Options
| Image | Product Name | Manufacturer | Price Range | |
|---|---|---|---|---|
 | 3,4-Epoxytetrahydrothiophene-1,1-dioxide | ChemScene | ₹ 7,015.92 - ₹ 61,945.44 | |
 | 4509-11-9 | 3,4-Epoxytetrahydrothiophene-1,1-dioxide | A2B Chem | ₹ 8,299.32 - ₹ 67,849.08 |
Related Products
Description
- Application: Used to prepare sulfolene derivatives[1] and acyclic polyenes used in natural product synthesis.[2] For a synthesis, see Tetrahedron Lett. [3]
SAFETY INFORMATION
Pictograms
Signal Word
Warning
Hazard Statements
Precautionary Statements
P261 - P280 - P301 + P312 - P302 + P352 + P312 - P304 + P340 + P312 - P305 + P351 + P338
Hazard Classifications
Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Acute Tox. 4 Oral - Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3
Target Organs
Respiratory system
WGK
WGK 3
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
Compare Similar Items
Show Difference
Assay: 97%
mp: 145-150 °C (lit.)
SMILES string: O=S1(=O)CC2OC2C1
InChI: 1S/C4H6O3S/c5-8(6)1-3-4(2-8)7-3/h3-4H,1-2H2
InChI key: SZAIAWVGWTXVMB-UHFFFAOYSA-N
Assay:
97%
mp:
145-150 °C (lit.)
SMILES string:
O=S1(=O)CC2OC2C1
InChI:
1S/C4H6O3S/c5-8(6)1-3-4(2-8)7-3/h3-4H,1-2H2
InChI key:
SZAIAWVGWTXVMB-UHFFFAOYSA-N
Assay: 97%
mp: __
SMILES string: [H]\C([H])=C(\[H])O[Si](C)(C)C
InChI: 1S/C5H12OSi/c1-5-6-7(2,3)4/h5H,1H2,2-4H3
InChI key: HFTNNOZFRQLFQB-UHFFFAOYSA-N
Assay:
97%
mp:
__
SMILES string:
[H]\C([H])=C(\[H])O[Si](C)(C)C
InChI:
1S/C5H12OSi/c1-5-6-7(2,3)4/h5H,1H2,2-4H3
InChI key:
HFTNNOZFRQLFQB-UHFFFAOYSA-N
Assay: __
mp: 200 °C (lit.)
SMILES string: CCCCCCCCCCCCCCCCCC(=O)O[Mg]OC(=O)CCCCCCCCCCCCCCCCC
InChI: 1S/2C18H36O2.Mg/c2*1-2-3-4-5-6-7-8-9-10-11-12-13-14-15-16-17-18(19)20;/h2*2-17H2,1H3,(H,19,20);/q;;+2/p-2
InChI key: HQKMJHAJHXVSDF-UHFFFAOYSA-L
Assay:
__
mp:
200 °C (lit.)
SMILES string:
CCCCCCCCCCCCCCCCCC(=O)O[Mg]OC(=O)CCCCCCCCCCCCCCCCC
InChI:
1S/2C18H36O2.Mg/c2*1-2-3-4-5-6-7-8-9-10-11-12-13-14-15-16-17-18(19)20;/h2*2-17H2,1H3,(H,19,20);/q;;+2/p-2
InChI key:
HQKMJHAJHXVSDF-UHFFFAOYSA-L
Assay: ≥99.5% trace metals basis
mp: __
SMILES string: [Mg]1[Mg]N=N[Mg]1
InChI: 1S/3Mg.N2/c;;;1-2/q;2*+1;-2
InChI key: VZPQZBKNAUHPOS-UHFFFAOYSA-N
Assay:
≥99.5% trace metals basis
mp:
__
SMILES string:
[Mg]1[Mg]N=N[Mg]1
InChI:
1S/3Mg.N2/c;;;1-2/q;2*+1;-2
InChI key:
VZPQZBKNAUHPOS-UHFFFAOYSA-N