496863
Pentakis(dimethylamino)tantalum(V)
99.99%
Manufacturer: Sigma Aldrich
CAS Number: 19824-59-0
Synonym(S): PDMAT, TADMA, Ta(NMe2)5, Tantalum dimethylamide
Select a Size
| Pack Size | SKU | Availability | Price |
|---|---|---|---|
| 5 G | 496863-5-G | In Stock | ₹ 33,665.75 |
496863 - 5 G
In Stock
Quantity
1
Base Price: ₹ 33,665.75
GST (18%): ₹ 6,059.835
Total Price: ₹ 39,725.585
Quality Level
100
Assay
99.99%
form
solid
reaction suitability
core: tantalumreagent type: catalyst
mp
100 °C (dec.) (lit.)
SMILES string
CN(C)[Ta](N(C)C)(N(C)C)(N(C)C)N(C)C
InChI
1S/5C2H6N.Ta/c5*1-3-2;/h5*1-2H3;/q5*-1;+5
InChI key
VSLPMIMVDUOYFW-UHFFFAOYSA-N
Other Options
| Image | Product Name | Manufacturer | Price Range | |
|---|---|---|---|---|
 | Sigma Aldrich Fine Chemicals Biosciences Pentakis(dimethylamino)tantalum(V) 99.99% | 19824-59-0 | MFCD01631286 | 5G | Sigma Aldrich Fine Chemicals Biosciences | ₹ 30,395.19 | |
 | Pentakis(dimethylamino)tantalum(V) | Sigma Aldrich | ₹ 33,665.75 | |
 | 19824-59-0 | Dimethylamine pentatantalum salt | A2B Chem | ₹ 10,609.44 - ₹ 1,22,778.60 |
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Description
- General description: Atomic number of base material: 73 Tantalum
- Features and Benefits: Volatile solid CVD precursor to tantalum nitride (TaN) thin films. Also yields tantalum oxide (Ta2O5) thin films when O2, H2O, NO or H2O2 is present during the deposition process. Ta2O5 thins films show promise as gate dielectric materials in the manufacture of integrated circuits.
SAFETY INFORMATION
Pictograms
Signal Word
Danger
Hazard Statements
Precautionary Statements
P210 - P231 + P232 - P260 - P280 - P303 + P361 + P353 - P305 + P351 + P338
Hazard Classifications
Eye Dam. 1 - Flam. Sol. 1 - Skin Corr. 1B - Water-react 1
WGK
WGK 3
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
Compare Similar Items
Show Difference
Quality Level: 100
Assay: 99.99%
form: solid
reaction suitability: core: tantalumreagent type: catalyst
mp: 100 °C (dec.) (lit.)
SMILES string: CN(C)[Ta](N(C)C)(N(C)C)(N(C)C)N(C)C
InChI: 1S/5C2H6N.Ta/c5*1-3-2;/h5*1-2H3;/q5*-1;+5
InChI key: VSLPMIMVDUOYFW-UHFFFAOYSA-N
Quality Level:
100
Assay:
99.99%
form:
solid
reaction suitability:
core: tantalumreagent type: catalyst
mp:
100 °C (dec.) (lit.)
SMILES string:
CN(C)[Ta](N(C)C)(N(C)C)(N(C)C)N(C)C
InChI:
1S/5C2H6N.Ta/c5*1-3-2;/h5*1-2H3;/q5*-1;+5
InChI key:
VSLPMIMVDUOYFW-UHFFFAOYSA-N
Quality Level: __
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form: __
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mp: __
SMILES string: __
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Assay: 98%
form: __
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mp: 141-144 °C (lit.)
SMILES string: CC(C)(C)OC(=O)NC(=N)NC(=O)OC(C)(C)C
InChI: 1S/C11H21N3O4/c1-10(2,3)17-8(15)13-7(12)14-9(16)18-11(4,5)6/h1-6H3,(H3,12,13,14,15,16)
InChI key: VPWFNCFRPQFWGS-UHFFFAOYSA-N
Quality Level:
__
Assay:
98%
form:
__
reaction suitability:
__
mp:
141-144 °C (lit.)
SMILES string:
CC(C)(C)OC(=O)NC(=N)NC(=O)OC(C)(C)C
InChI:
1S/C11H21N3O4/c1-10(2,3)17-8(15)13-7(12)14-9(16)18-11(4,5)6/h1-6H3,(H3,12,13,14,15,16)
InChI key:
VPWFNCFRPQFWGS-UHFFFAOYSA-N